The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 1980

Filed:

Oct. 20, 1978
Applicant:
Inventors:

Akio Tanaka, Ono, JP;

Mizuo Edamura, Kobe, JP;

Satoshi Furuitsu, Kakogawa, JP;

Satoru Kunise, Akashi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
148 166 ; 2041 / ;
Abstract

The present invention provides an ion-nitriding process wherein a workpiece having at least one aperture is subjected to a DC voltage in an atmosphere of nitrogen-containing gas, characterized in that a first nitriding step is carried out under a vacuum which is strong enough to suppress arc discharge on the workpiece, and a second nitriding step is carried out under a weaker vacuum as compared to that in the first step so that glow discharge is produced even in the aperture of the workpiece.


Find Patent Forward Citations

Loading…