The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 1980

Filed:

Aug. 28, 1978
Applicant:
Inventors:

Alex P Symborski, Anderson, SC (US);

Ray M Fulmer, Aiken, SC (US);

David W Thomas, Newark, OH (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C03B / ;
U.S. Cl.
CPC ...
65 / ; 65-2 ; 65 1 / ; 83913 ; 226 91 ; 226 92 ;
Abstract

Method and apparatus for forming glass filaments are provided by (a) a plurality of spaced apart forming sections wherein each section is comprised of (i) a feeder adapted to supply a plurality of streams of glass to be attenuated into continuous filaments, a zone being defined by the paths of the free-falling streams, (ii) applicator means laterally spaced from said zone adapted to apply a coating to the advancing filaments, (iii) first guide means laterally spaced from said zone adapted to gather the filaments into a strand, the guide means and applicator being positioned such that the coating is applied to the filaments at a region external to said zone and intermediate the feeder and the first guide means along the path of advancement of the filaments, (iv) secondary attenuation means laterally spaced from the zone adapted to advance the filaments as waste, (b) a single primary attenuation means adapted to simultaneously attenuate the streams from each section into filaments; and (c) second guide means positioned to advance the strands from each section external to all of said zones when the strands are being advanced by the primary attenuation means, said feeders, applicator means, first guide means and second guide means being positioned such that any of said strands are advanced along paths external to all of said zones and in the absence of contact with any other of said strands when any of the waste strands are advanced by the secondary attenuation means.


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