The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 1980
Filed:
Mar. 08, 1978
F Roland Leon, Los Angeles, CA (US);
Tosco Corporation, Los Angeles, CA (US);
Abstract
A seal assembly and method for providing a contaminant-free, fluid-tight seal in a rotary kiln or similar rotating apparatus. A seal is provided between the rotating surfaces and the stationary surfaces of the kiln by providing an annular seal chamber defined by a rotating, outwardly-facing, U-shaped annular rim integral with the rotating surfaces of the rotary kiln and a stationary bellows chamber assembly integral with the stationary surfaces of the rotary kiln. An effective seal is maintained between the bellows chamber assembly and the annular rim by injecting a pressurized fluid into the bellows chamber so as to sufficiently bias its surfaces outwardly against the surfaces of the annular rim. The annular seal chamber is separated from the kiln chamber and its fluids and contaminants by an annular isolating chamber. The bellows chamber assembly prevents fluid communication between the seal chamber and the isolating chamber. The isolating chamber may communicate with the fluids of the kiln chamber via a one-way flap valve, and fluid is injected into the isolating chamber at a pressure sufficient to cause the injected fluid to flow from the isolating chamber, through the one-way valve and into the kiln chamber so as to prevent the flow of kiln fluids and contaminants into the isolating chamber.