The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 1980
Filed:
Jun. 26, 1978
Thomas Klein, Saratoga, CA (US);
National Semiconductor Corporation, Santa Clara, CA (US);
Abstract
A process for constructing self-aligned electrodes overlying a surface of a semiconductor substrate is disclosed. The process utilizes a substrate which is substantially transparent to infrared radiation. One step of the process includes forming spaced apart ones of the electrodes with a conductive material that is highly absorbtive of infrared radiation. Subsequently, a continuous layer of heat sensitive polymer is formed over and between these spaced apart electrodes. The resulting structure is exposed to infrared radiation which heats the spaced apart electrodes. This heat polymerizes the heat sensitive polymer layer in all regions that directly overlie the spaced apart electrodes. These polymerized regions form a mask that is used to construct other electrodes between and in alignment with the spaced apart electrodes.