The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 1980

Filed:

Mar. 13, 1978
Applicant:
Inventors:

Walter W Harvey, Bedford, MA (US);

Alkis C Makrides, New Center, MA (US);

Assignee:

EIC Corporation, Newton, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B / ; C01C / ; C01C / ;
U.S. Cl.
CPC ...
423220 ; 423238 ; 423548 ; 423566 ;
Abstract

A process is described for the simultaneous removal of H.sub.2 S and ammonia from gaseous streams containing other acid and basic gases. The process comprises closed loop scrubbing of the gaseous stream with a copper sulfate-ammonium sulfate solution to yield a copper sulfide precipitate, concurrent neutralization of the acidity generated in the scrubbing step by addition or scrubbing of ammonia and other basic gases, separating the precipitate, hydrothermally leaching the precipitate with oxygen or air under controlled temperature and pressure to reoxidize the sulfide to copper sulfate, recycling the copper sulfate to the scrubber, and rejecting sulfur from the system in the form of (NH.sub.4).sub.2 SO.sub.4.


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