The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 1980
Filed:
Nov. 30, 1977
Viktor Bodlaj, Munich, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A device is disclosed for the contact free thickness measurement of an object. A light source produces a sharply bundled light ray which is divided into two light rays and simultaneously and periodically deflected so as to scan over opposite surfaces of the object. A reference detector determines a time t.sub.O at which two rays corresponding to a zero position of the light deflector strike the object. A first detector picks up light only along a first sighting line which intersects the object at a first point on one surface thereof. This first detector detects a time t.sub.A when one of the two light rays scans across the first point. A second detector picks up light only along a second sighting line which intersects the object at a second point on the one surface thereof. The second detector detects a time t.sub.B when the one light ray scans across the second point. A third detector is provided for picking up light only along a third sighting line which intersects the object at a third point on the opposite surface thereof. The third detector detects a third time t.sub.C when the other light ray scans across the third point. A measuring device is provided for computing distances of the first, second, and third points from a reference plane and for computing a thickness of the object therefrom.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile