The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 1980

Filed:

Aug. 10, 1978
Applicant:
Inventors:

Werner Fritsch, Bad Soden am Taunus, DE;

Ulrich Stache, Hofheim am Taunus, DE;

Ernst Lindner, Frankfurt am Main, DE;

Assignee:

Hoechst Aktiengesellschaft, Frankfurt am Main, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ; A61K / ; C07C / ; C07C / ;
U.S. Cl.
CPC ...
42424853 ; 26032647 ; 2603 / ; 2603 / ; 2604 / ; 26050117 ; 544163 ; 544171 ; 544230 ; 544238 ; 544360 ; 544383 ; 544394 ; 544399 ; 544401 ; 546194 ; 546230 ; 546238 ; 560 21 ; 560 42 ; 562435 ; 562451 ; 42424855 ; 42424858 ; 424250 ; 424267 ; 424274 ; 424282 ; 424304 ; 424309 ; 424316 ; 424317 ;
Abstract

Compounds of formula I ##STR1## wherein R.sup.1 and R.sup.1' are identical or different and represent hydrogen, an alkyl radical or alkoxy radical having 1-4 carbon atoms, the allyl group, a halogen atom or the nitro group, R.sup.2 represents an acrylic acid radical or an acrylic acid nitrile radical of the formulae ##STR2## wherein R.sup.5 represents hydrogen, an alkyl radical having 1-5 carbon atoms, an aryl radical or aryl-lower alkyl radical either unsubstituted or substituted by lower alkyl or alkoxy, R.sup.6 represents hydrogen or an alkyl radical having 1-8 carbon atoms, R.sup.7 represents hydrogen, a lower alkyl radical or an aryl-lower alkyl radical, R.sup.3 and R.sup.4 represent together with the nitrogen atom a heterocyclic ring with 5-7 members being optionally substituted by C.sub.1 -C.sub.4 alkyl, in which ring one carbon atom may be replaced by one oxygen atom, sulfur atom or one further nitrogen atom, the latter may be substituted, or wherein R.sup.3 represents hydrogen and R.sup.4 represents a phenyl-alkylene or phenyl-alkylidene radical of the formula ##STR3## in which Alk is alkyl having 1 to 3 carbon atoms, and n is a figure from 1-3, and R.sup.8 and R.sup.9 are identical or different and represent hydrogen, an alkoxy radical having 1-3 carbon atoms or the benzoyl radical or R.sup.8 and R.sup.9 represent together the bismethylene dioxy radical, as well as the physiologically compatible acid addition salts and a process for preparing these compounds.


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