The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 04, 1980

Filed:

Dec. 20, 1978
Applicant:
Inventors:

Hans Bender, Leverkusen, DE;

Georg Schnabel, Hurth-Fischenich, DE;

Gottfried Duren, Cologne, DE;

Wolf Zabel, Seelscheid, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ; B03C / ;
U.S. Cl.
CPC ...
134 / ; 134 30 ; 134 36 ; 209214 ; 209222 ; 209232 ; 210222 ; 134102 ;
Abstract

A method and apparatus is disclosed for cleaning magnetic material attracted to a ferromagnetic matrix within a separating chamber of a magnetic separator. The magnetic material retained by the matrix is cleaned in a high pressure cleaning stage in which both a liquid medium and a gaseous medium are provided under pressure to clean the magnetic material. As the gaseous medium passes through the matrix, it does so with a pressure drop which is substantially lower than that of the liquid passing through the matrix. Consequently, as the gaseous medium expands, it transfers a portion of its kinetic energy to the liquid which provides improved and more rapid cleaning effects than known rinsing steps.


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