The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 1980
Filed:
Oct. 23, 1978
Applicant:
Inventor:
Marinus Van Renssen, Leola, PA (US);
Assignee:
RCA Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
29 2515 ; 29 2519 ;
Abstract
Apparatus and method are provided for determining the deviation in mask-to-faceplate spacing from a desired spacing during cathode-ray tube construction. The apparatus utilizes the novel method which comprises the steps of sensing the position of the interior surface of a faceplate without a shadow mask being mounted adjacent the faceplate, mounting a shadow mask adjacent the faceplate and sensing the position of a side of the shadow mask opposite the faceplate. The difference in the two second positions minus the shadow mask thickness is the deviation in the desired mask-to-faceplate spacing.