The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 1980
Filed:
Feb. 17, 1978
Applicant:
Inventors:
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D01D / ; H01J / ;
U.S. Cl.
CPC ...
250282 ; 250284 ;
Abstract
A process for analyzing charged particles wherein charged particles are impinged on a film of resist which is made of polymethylmethacrylate sensitive to charged particles, the resist film is dissolved and the mass of charged particles impinged is measured in terms of the dissolved resist or the resist left.
Kai, Yoshiaki. (1980). Process for analyzing charged particles (U.S. Patent No. 4189639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4189639
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile