The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 29, 1980

Filed:

Feb. 22, 1978
Applicant:
Inventors:

Naohiro Kubota, Urawa, JP;

Toshihiro Shibata, Urawa, JP;

Kazuo Sugibuchi, Tokyo, JP;

Assignee:

Argus Chemical Corporation, Brooklyn, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
260591 ; 260 / ; 260 / ; 260 / ; 260 / ; 2603 / ; 2605 / ; 2603 / ; 544101 ; 546101 ;
Abstract

A novel process is provided for preparing 5,5'-methylenebis(2-hydroxy-4-alkoxybenzophenone), comprising forming a novel 2-hydroxy-4-alkoxy-5-aminomethylbenzophenone by a reaction of a 2-hydroxy-4-alkoxybenzophenone with an amine and formaldehyde, and causing the 2-hydroxy-4-alkoxy-5-aminomethylbenzophenone to react with a 2-hydroxy-4-alkoxybenzophenone or to dimerize. Both the aminomethylhydroxyalkoxybenzophenone and the methylenebis (2-hydroxy-4-alkoxybenzophenone) which are prepared according to this invention are useful to prevent photo-degradation of organic materials, particularly as light stabilizers for synthetic resins.


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