The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 08, 1980

Filed:

Nov. 14, 1977
Applicant:
Inventors:

Haruo Nagai, Nakajo, JP;

Hiroshi Uehara, Nakajo, JP;

Kunikazu Nunokawa, Kurokawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ;
U.S. Cl.
CPC ...
526240 ; 252182 ; 2604 / ; 526 75 ; 526192 ; 528392 ;
Abstract

A method for producing a lead containing monomer composition comprising reacting a mixture comprising (1) at least one monomer selected from the group consisting of alkyl methacrylate having 1-4 carbon atoms in an alkyl group, hydroxyalkyl acrylate, hydroxyalkyl methacrylate and styrene, (2) acrylic or methacrylic acid, (3) an organic acid having the general formula: R.sub.1 COOH, wherein R.sub.1 is hydrocarbon residue having 5-20 carbon atoms and optionally (4) an organic acid having the general formula: R.sub.2 COOH, wherein R.sub.2 is hydrocarbon residue having 2-4 carbon atoms with lead monoxide. The composition is polymerized to obtain a radiation shielding polymer.


Find Patent Forward Citations

Nagai, Haruo. (1980). Method for producing a lead containing monomer composition and a (U.S. Patent No. 4182821). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4182821

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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