The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 1980
Filed:
Mar. 23, 1978
Marvin H Lehr, Bath, OH (US);
The B. F. Goodrich Company, Akron, OH (US);
Abstract
Chlorinated polyvinyl chloride resin (CPVC) is blended with a block copolymer of styrene and a diene (SD) or of styrene-diene-styrene (SDS), which block copolymer is referred to as a 'pro-modifier' because, by itself, it performs a dual function of processing aid and impact modifier in CPVC. For tailoring specific desirable impact properties and physical characteristics into a CPVC resin composition, it may be desirable to use a conventional impact modifier in combination with the block copolymer. When the block copolymer is so used, such use being referred to as that of a 'co-modifier', the block copolymer and conventional impact modifier provide a CPVC composition with unexpectedly enhanced impact strength. The block copolymer consists essentially of a vinyl aromatic compound and a conjugated idene, such as styrene-diene (SD) diblock copolymer, or a styrene-diene-styrene (SDS) polyblock copolymer having a linear or radial block structure, or mixtures of linear and radial block copolymers. When a conventional impact modifier is used, it may be any elastomer additive, preferably a nucleated rubbery graft copolymer, but a minor quantity by weight of a synthetic resinous interpolymer which contains no rubber polymer, may also be used.