The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 1979
Filed:
Nov. 24, 1978
Applicant:
Inventors:
Thomas J Moravec, Eden Prairie, MN (US);
Richard A Skogman, Minneapolis, MN (US);
Assignee:
Honeywell Inc., Minneapolis, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; B05D / ;
U.S. Cl.
CPC ...
427160 ; 427162 ; 427164 ;
Abstract
The present invention directed to antireflective coatings presents a new method for producing graded index films from alternating very thin layers of two materials with proper but differing indices. During deposition the thickness of each of the many layer pairs deposited can remain fairly uniform while the layer thickness of the two materials making up each pair is adjusted so that the resulting average index matches the index of the desired profile for that part of the total thickness. A two source evaporation deposition system is used and the two materials may be, for example, thallium iodide and lead fluoride.