The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 1979
Filed:
Aug. 27, 1975
Ivar Giaever, Schenectady, NY (US);
General Electric Company, Milwaukee, WI (US);
Abstract
In carrying out a purification and/or concentration step of antigens or antibodies, a substrate is immersed in a first aqueous medium containing a specifically reacting antigen to coat said substrate with a monomolecular layer of said specifically reacting antigen. The resulting coated substrate is then immersed in a second aqueous medium containing immunologically reactive antibody specific to the antigen in the first aqueous medium to complex said immunologically reactive antibody with said specifically reacting antigen. The resulting substrate is then immersed in a reagent capable of cleaving the immunological bond between said immunologically reactive antibody and said specifically reactive antigen and forming a solution of said immunologically reactive antibody in the immunological bond-cleaving solution and leaving said specifically reacting antigen coated on said substrate. The method can be reversed for preparing a purified concentration of an immunologically reactive antigen whereby a specifically reacting antibody is substituted for the antigen and the corresponding immunologically reactive antigen is substituted for the antibody.