The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 1979
Filed:
Nov. 07, 1975
Applicant:
Inventors:
Robert F Bailey, Los Alamitos, CA (US);
A Brooke Jones, La Mirada, CA (US);
Assignee:
Rockwell International Corporation, El Segundo, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156643 ; 156656 ; 156659 ; 427131 ; 365 32 ;
Abstract
A process for fabricating magnetic bubble domain devices having multiple layers. The process is a single high resolution mask process. A magnetizable layer, a conductive layer and at least one dielectric spacer layer are provided on a suitable magnetic bubble domain material and etched in a suitable manner such as by ion milling. The material layers may be applied such that the conductive layer is applied first and the magnetizable layer applied thereafter or vice versa.