The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 1979
Filed:
Jun. 30, 1977
Frederick H Dill, South Salem, NY (US);
Raymond E Tibbetts, Mahopac, NY (US);
Janusz S Wilczynski, Ossining, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A unit magnification optical system having micron resolution capability over a broad frequency spectrum. A spherical concave mirror is used to provide unit magnification at high numerical aperture with respect to object and image planes which are both located at or in the proximity of the center of curvature of the mirror, or the optical equivalent thereof. A first refractory element optically close to the object and image planes corrects longitudinal chromatic aberration of the principal rays while a second refractory element optically close to the mirror corrects residual longitudinal chromatic aberration of the marginal rays. In the preferred embodiment, a double prism arrangement located between the first refractory element and the center of curvature of the mirror optically reflects the object and image planes to parallel opposed positions having a common axis perpendicular to the axis of the mirror. The system may be used for either step-and-repeat or scanning exposure operations in fabricating microcircuits.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile