The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 1979
Filed:
Jan. 23, 1978
Armin K Weiss, Rochester, NY (US);
John R Clarke, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for forming on a substrate a relatively thick, densified, essentially non-porous, fine-grained layer of a non-conductive material. The method comprises the steps of vapor depositing onto such substrate a starting material while simultaneously bombarding the substrate with ions of a preselected gas. During the process, the substrate is disposed in the atmosphere of a preselected gas, and an RF field is established between the substrate and an opposing electrode structure to produce a plasma of such gas in the vicinity of the substrate. The substrate is electrically biased to attract ions from the plasma, such ions serving to impact on the substrate and thereby densify the vapor deposit thereon. Preferably, the starting material is one which reacts with the gas ions to form the desired material on the substrate; alternatively, the starting material comprises the desired material, in which case the gas plasma preferably comprises an inert gas.