The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 1979
Filed:
May. 03, 1978
Oskar Buechner, Dudenhofen, DE;
Volker Gierth, Ludwigshafen, DE;
BASF Aktiengesellschaft, , DE;
Abstract
A process for the continuous high pressure polymerization of ethylene in a polymerization system which comprises a polymerization zone (A), a high pressure product isolation zone (B), a throttling and control system (C), a low pressure product isolation zone (D), a second throttling and control system (E) and a discharge extruder (F), and wherein, according to the invention, the level of the ethylene polymer in the high pressure product isolation zone (B) and in the low pressure product isolation zone (D) is varied periodically. The process gives an ethylene polymer of improved homogeneity, which when used to manufacture films does not tend to form specks or fisheyes.