The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 1979
Filed:
Apr. 24, 1978
Applicant:
Inventors:
Iwao Tabushi, Sakyo-ku, Kyoto-shi, Kyoto-fu, JP;
Nobuaki Shimizu, Sodegaura, JP;
Kazuo Yamamura, Kyoto, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ; C08F / ;
U.S. Cl.
CPC ...
260 / ; 210 24 ; 210 / ; 260 / ; 252426 ; 2524 / ;
Abstract
A cyclodextrin derivative-containing a polystyrene based polymer containing units of structure having the formula: ##STR1## (wherein m is an integer of 1 to 10; n is 4, 5 or 6; R.sub.1 and R.sub.2 are hydrogen or alkyl groups containing 1 to 3 carbon atoms; and Z is an alkylene group containing 1 to 5 carbon atoms); a metal complex of the polystyrene based polymer; and a process for the production of the polystyrene based polymer or metal complex thereof.
Quick Actions:
Tabushi, Iwao. (1979). Polystyrene based polymers containing cyclodextrin derivatives, metal (U.S. Patent No. 4169079). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4169079
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile