The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 1979

Filed:

Feb. 21, 1978
Applicant:
Inventor:

Robert J Collier, New Providence, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
2504 / ; 250398 ; 2504 / ;
Abstract

An attractive high-throughput technique for writing microcircuit patterns with a scanning electron spot of variable size is described in application Ser. No. 855,608, filed Nov. 29, 1977. In such an electron beam exposure system, two spaced-apart apertured mask plates with a deflector therebetween are included in the electron column of the system. As described herein, a third apertured mask plate and an associated deflector are serially added to the aforenoted components in the column. In this way, the throughput and other performance characteristics of such a system are significantly enhanced.


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