The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 1979
Filed:
Aug. 15, 1977
Kunio Sakurai, Hino, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Abstract
The photomask blank comprises a transparent substrate, a chromium film directly formed on the substrate and having a thickness of less than 15 m.mu., an intermediate layer formed on the chromium film and containing chromium oxide and a metal mask layer made of chromium and formed on the intermediate layer. The intermediate layer comprises a single chromium oxide film or a composite layer of a chromium oxide film and a pure chromium film or a mixture of chromium and chromium oxide. The photomask is prepared by etching the chromium film, the intermediate layer and the mask layer of the photomask blank described above.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile