The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 1979
Filed:
Dec. 14, 1977
Chesterfield F Seibert, Cortland, NY (US);
Pall Corporation, Glen Cove, NY (US);
Abstract
Apparatus is provided for reducing the concentration of a first gas in a mixture thereof with a second gas to below a limiting maximum concentration thereof in the second gas, comprising an effluent flow control valve in the effluent line for directing the effluent gas from the chamber that is on-stream for adsorption; the effluent valve comprising a valve chamber having separate inlets and inlet passages leading thereinto, one from the effluent line from each sorbent chamber; a valve seat across each inlet; and a free-rolling ball valve responsive to effluent line gas pressure at each inlet related to downstream pressure to displace the ball and open the inlet leading from the sorbent chamber on-stream for adsorption, and direct the ball across the other inlet leading from the sorbent chamber off-stream for adsorption and close that inlet, thereby preventing effluent gas flow through that inlet into the off-stream chamber, and a bleed line for effluent purge flow, bypassing the closed inlet and interconnecting the inlet passages or one inlet passage or the valve chamber with one of the effluent lines for reverse purge flow of effluent gas through that effluent line into the sorbent chamber that is off-stream for adsorption but on-stream for regeneration, to regenerate the sorbent bed with such purge flow.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile