The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 1979

Filed:

Dec. 21, 1977
Applicant:
Inventor:

Martin Mark, Feldkirch, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 250398 ; 250443 ;
Abstract

An apparatus for treating a substrate with an ion beam comprising a closed ousing which defines a substantially evacuatable chamber, a drum having a circumferential portion with an annular inside surface rotatably mounted in the chamber, drive means connected to the drum for rotating it at a selected speed to establish a centrifugal force toward the annular inside surface of the drum and ion beam generating means associated with the housing for directing an ion beam into the chamber and toward the annular inside surface. A substrate is supportable on the inside surface of the drum and conforms with the surface so as to be closely associated therewith under the influence of the centrifugal force. This association establishes a thermally conductive relationship between the substrate and the circumferential portion so that heat generated in the substrate due to the ion beam can be dissipated through the circumferential portion of the drum.


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