The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 1979

Filed:

Oct. 26, 1976
Applicant:
Inventors:

Yataro Ichikawa, Fuchu, JP;

Yoshiyuki Yamanaka, Iwakuni, JP;

Hideki Tsuruta, Hino, JP;

Mamoru Yamamoto, Iwakuni, JP;

Kenichi Kato, Iwakuni, JP;

Assignee:

Teijin Limited, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
260578 ; 260582 ; 260645 ; 2606 / ; 2606 / ; 2606 / ; 2606 / ; 568750 ; 568751 ; 568752 ; 585 25 ; 585409 ; 585422 ; 585817 ; 585840 ; 585867 ;
Abstract

An inclusion compound comprising meta-cyclophane of the formula ##STR1## and at least one benzene derivative included therein. And a process for separating an isomer containing a substituent at least at the 1- and 4-positions from a mixture containing isomers of a benzene derivative, which comprises contacting the meta-cyclophane with the mixture containing isomers of a benzene derivative thereby to form an inclusion compound in which an isomer containing a substituent at least at the 1- and 4-positions is included in the meta-cyclophane, then separating the inclusion compound from the mixture, and thereafter separating the isomer from the inclusion compound.


Find Patent Forward Citations

Loading…