The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 1979
Filed:
Jul. 19, 1977
Applicant:
Inventors:
Constant J Geenen, Eindhoven, NL;
Johannes C Van Nes, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
96 361 ; 96 2 / ; 354-1 ; 427 68 ;
Abstract
A window part for a color CRT is coated with a photosensitive layer which is exposed through the apertures of a shadow mask to a rotating light source having a direction of greatest light intensity directed to the center of rotation.
Geenen, Constant. (1979). Method of optically projecting a pattern of substantially circular (U.S. Patent No. 4152154). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4152154
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile