The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 1979

Filed:

Sep. 29, 1977
Applicant:
Inventor:

Alain Wavre, Geneva, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23P / ;
U.S. Cl.
CPC ...
219 / ; 219 / ; 318 39 ; 318571 ;
Abstract

A control system, in an EDM machine, for simultaneously displacing the electrode tool and the electrode workpiece relative to each other along both an axis of penetration of the electrode tool into the workpiece and a translation motion in a plane perpendicular to the axis of penetration of the electrode tool into the workpiece. The control system consists of logic circuitry providing a variable signal obtained by integrating as a function of time the difference between a signal representative of the machining condition and a reference signal, apportioning the variable signal between a first and a second electrical signal and interrelating the apportionment with a control of the relative position of the electrodes along the axis of penetration and of the eccentricity of the relative translation movement, respectively, as a function of the first electrical signal and of the second electrical signal.


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Wavre, Alain. (1979). Apparatus for controlling the relative motion of the electrodes in (U.S. Patent No. 4150275). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4150275

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