The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 1979
Filed:
Jun. 30, 1977
Jesse C Bunch, Silver Spring, MD (US);
Other;
Abstract
A radiation concentration system for reflecting incident radiation rays from a displaceable source to a fixedly positioned focus. The concentration system includes a positioning mechanism for maintaining a mirror element plane normal to a bisecting line of an incident and a reflected angle of radiation impinging on and being reflected from the mirror plane. The radiation concentrating system provides for a displacement mechanism which drives the mirror element about mutually perpendicular axis lines. The displacement mechanism drives the mirror element about a first axis line extending in a direction from the displacement mechanism to the focus and further drives the mirror element about a second axis line normal to the first axis line. In this manner, the mirror element is maintained in a predetermined positional relation for reflection of the incident radiation to the fixed focus.