The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 1979
Filed:
Mar. 28, 1978
Ralf Kersten, Rottach-Egern, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A method for the production of optical directional couplers has a substrate with optical waveguides formed in a surface thereof which are longitudinally coupled by having the guides extend parallel to each other for a predetermined distance. The waveguides have a higher index of refraction than the substrate. By ion implantation step, the area of the substrate adjacent the surface which is covered has its index of refraction raised, while at the same time, the exposed areas which will form the waveguides is also subjected to the ion bombardment. Thereafter, by a second ion implantation step, the ions penetrate further into the region of the substrate where the waveguides are being formed to raise the index of refraction thereof. By this technique, narrow low-light-loss bends are produced.