The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 1979
Filed:
May. 20, 1977
Applicant:
Inventor:
Gabor Paal, Stuttgart, DE;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
96 36 ; 96 362 ; 96 75 ; 96 8 / ; 96 9 / ; 9611 / ;
Abstract
The density of defects formed during the exposure of a positive resist layer, due to the loss of photoresist in circular areas is reduced by the addition of an antistatic agent. The resist layer includes a phenol-formaldehyde resin and an o-diazoquinone photoactive compound and a suitable antistatic agent is a 2-alkyl-N-hydroxyethyl imidazolinium salt.
Paal, Gabor. (1979). Method of reducing the defect density in a positive-working photoresist (U.S. Patent No. 4142892). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4142892
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile