The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 1979
Filed:
Nov. 30, 1977
Fred H Pollak, New York, NY (US);
Paul M Raccah, Chicago, IL (US);
Yeshiva University, New York, NY (US);
Abstract
There is disclosed an apparatus and method for measuring the variations in composition across the surface of binary and ternary alloy semiconductors utilizing electrolyte electroreflectance. The technique is non-destructive, can readily be employed under atmospheric conditions at room temperature, and is sensitive enough to determine changes of composition of about 1% with a spatial resolution of about 100.mu.. The procedure is very useful for the selection of crystals for detector arrays, solid states lasers, or electronic devices. It can also be utilized as a convenient tool for evaluating material grown either in bulk form or epitaxial layers, thus providing feedback for the adjustment of crystal growth parameters. The apparatus includes a mechanism for stepping the semiconductor being investigated in two dimensions while performing electroreflectance measurements; the measurement results can then be plotted on contour maps.