The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 1979
Filed:
Jun. 01, 1977
Applicant:
Inventor:
Kenneth W Ehlers, Alamo, CA (US);
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ; H05H / ;
U.S. Cl.
CPC ...
3151114 ; 313155 ; 313161 ; 3132314 ; 313362 ;
Abstract
A device for generating a homogeneous ion-electron plasma from which a large ion beam can be extracted. The device utilizes hairpin-shaped filaments lining at least portions of the wall of the chamber which have been rotated 90 degrees from prior known approaches. This provides a very significant result in that the DC current flowing through the filaments produces a small solenoidal magnetic field that impedes the emitted electrons from striking the walls of the chamber, which may be of a cylindrical or rectangular configuration. This improves the efficiency of the ion source and provides additional space for more filaments, while providing a very uniform plasma density profile which is noise-free.