The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 1979

Filed:

Sep. 22, 1977
Applicant:
Inventors:

Jean-Pierre A Ghekiere, Antwerp, BE;

Hugo K Peeters, Mortsel, BE;

Assignee:

AGFA-GEVAERT N.V., Mortsel, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D / ; G01D / ;
U.S. Cl.
CPC ...
346-1 ; 346 / ; 346135 ;
Abstract

A method of directly forming a light scattering image, wherein a recording layer is information-wise exposed in the visible light spectral region to a light energy dose of at least 10.sup.-1 Ws cm.sup.-2 with a focussed laser-beam having a beam intensity of at least 10.sup.4 W cm.sup.-2. The recording layer is a thermoplastic polymer layer having dissolved therein at least one substance absorbing visible light, which substance imparts a specular density to the recording layer of at least 0.1 with respect to a monochromatic wave of the laser-beam applied in the exposure and is present in an amount of maximum 10% by weight with respect to the thermoplastic polymer of the layer, the recording layer being capable of directly developing in the areas struck by said beam, minute light-scattering centers providing a minimum increase of white light specular density of 0.2 when measured with respect to a transparent background and determined as described hereinbefore, but being incapable of developing such centers when exposed with the same laser-beam at an intensity reduced by a factor of 10.


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