The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 1979
Filed:
Sep. 19, 1977
Applicant:
Inventor:
Kunio Sakurai, Hino, JP;
Assignee:
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
2041 / ; 2041 / ; 427250 ; 427255 ; 428433 ;
Abstract
The photomask blank comprises a transparent substrate, a first chromium film formed on the substrate by sputtering, a second chromium film formed on the first chromium film by vacuum evaporation and a chromium oxide film by vacuum evaporation. The relative thickness of the two chromium films and the chromium oxide film is adjusted to improve resolution of a pattern and to decrease reflectance.
Sakurai, Kunio. (1979). Photomask blanks and method of preparing the same (U.S. Patent No. 4139443). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4139443
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile