The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 1979
Filed:
Jul. 06, 1976
James M Jaffe, Los Altos, CA (US);
Jack I Penton, Castro Valley, CA (US);
Intersil, Inc., Cupertino, CA (US);
Abstract
An integrated circuit aluminum-silicon electrical contact may be fabricated in a diffusion region formed in a monocrystalline silicon semiconductor layer by converting the upper portion of the diffusion region into an amorphous region. Alloy pitting is substantially decreased since the solubility of silicon in aluminum is highly dependent upon crystallographic orientation of the silicon and decreases as the silicon approaches an amorphous form. The amorphous region may be formed by implanting arsenic ions with an energy of at least 180 keV and a dosage of approximately 10.sup.15 ions/cm.sup.2.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile