The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 1979

Filed:

Mar. 31, 1977
Applicant:
Inventors:

Franz Auracher, Munich, DE;

Ralf Kersten, Rottach-Egern, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350 9615 ; 65 43 ; 350347 ;
Abstract

An output/input coupler for multi-mode glass fibers characterized by a substrate, a main line having at least one flat surface, and at least one branch line having one flat surface. The main line and branch line are arranged on the substrate with the flat surfaces being in spaced parallel facing relationship. Preferably, the main line has the square cross section and the flat surface of each branch line extends at an angle to the axis of the branch line so that the branch line has a wedge-shaped configuration in the plan view. A transparent material may be imposed in the space between the spaced parallel facing surfaces of the main and branch lines. This transparent material may be a liquid crystal material whose optical properties are changed by the application of an electric field created by a pair of electrodes which overlie the space between the parallel facing surfaces. The coupler is preferably formed by using a photolithographic process to form the coupler from a layer of photosensitive material which is disposed on the substrate. The photolithographic process includes exposing the photosensitive material utilizing a mask conforming to the shape and disposition of the main and branch lines, and developing the exposed material to leave the main and branch lines on the substrate.


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