The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 1979

Filed:

Aug. 11, 1976
Applicant:
Inventors:

Gijsbertus Bouwhuis, Eindhoven, NL;

Johannes VAN DER Wal, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
331 / ; 331 / ; 331 / ; 350163 ; 350164 ; 350165 ;
Abstract

A gas discharge laser comprises a multilayer coupling-out mirror including a plurality of alternate dielectric layers of high (H) and low (L) indices of refraction. A radiation-attenuating film element, preferably a metal film, is sandwiched between a pair of L dielectric layers located near the mirror substrate to provide an asymmetrical characteristic whereby the laser becomes relatively insensitive to light reflected towards it, which in turn reduces any tendency toward fluctuation in the intensity of the laser beam. The device is especially useful in systems for reading out information from a video record carrier wherein the reflected light is modulated and if returned to the laser would produce output power fluctuations therein.


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