The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 1979
Filed:
Feb. 11, 1977
Other;
Abstract
A plasma polymerization process for the deposition of a dielectric polymer coating on a substrate comprising disposing the substrate in a closed reactor between two temperature-controlled electrodes connected to a power supply, maintaining a vacuum within the closed reactor, causing a monomer gas or a gas mixture of a monomer and diluent to flow into the reactor, generating a plasma between the electrodes, and varying and controlling the dielectric constant of the polymer coating being deposited by regulating the gas total and partial pressures, the electric field strength and frequency, and the current density. A monomer, such as a polar saturated or unsaturated nitrogen-containing compound, or a monomer and diluent, such as a saturated or unsaturated aliphatic hydrocarbon and nitrogen, can be polymerized to form a dielectric coating having a varying dielectric constant in accordance with this plasma polymerization process.