The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 1979

Filed:

Jul. 21, 1977
Applicant:
Inventors:

Shiro G Kimura, Schenectady, NY (US);

Raymond G Lavigne, Waterford, NY (US);

Warella R Browall, Scotia, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ; B01D / ;
U.S. Cl.
CPC ...
428220 ; 55158 ; 2608 / ; 260827 ; 428412 ; 428447 ; 428516 ; 428523 ;
Abstract

An improved method is described for solvent casting ultrathin non-porous methylpentene polymer films. The casting solution comprises methylpentene polymer of a mixture thereof with organopolysiloxane-polycarbonate copolymer dissolved in a solvent system and is characterized by being able to spontaneously spread over the surface of the liquid casting substrate. In a preferred embodiment, large-area films less than 200 Angstroms in thickness may be repeatedly formed. The solidified films remain relatively free of tensile stress during formation. The casting solution is deposited in a narrow, longitudinally-extending defined region at the surface of the casting substrate. The surface area and perimeter of the defined region are enlarged over the surface of the casting substrate in a manner whereby the casting solution is moved relative to the casting substrate and, after desolvation, the polymer film formed remains stationary relative to the casting substrate and relatively free of tensile stress. The films are useful as semipermeable membranes for selectively removing oxygen gas from mixtures thereof with nitrogen gas.


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