The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1978
Filed:
Sep. 11, 1974
Applicant:
Inventors:
Fumio Onoki, Tokorozawa, JP;
Hajime Kamiya, Kokubunji, JP;
Assignee:
Hoya Lens Co., Ltd., , JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427164 ; 350164 ; 427255 ; 4272 / ; 4272 / ; 427167 ;
Abstract
A method for coating silicon oxide SiO film and silicon dioxide SiO.sub.2 film on the surface of transparent optical material of glass or syntheic resin whose refractive indices are varied by changing the condition of vapor-deposition, under a predetermined condition of vapor-deposition so as to form a firm and durable anti-reflection film.