The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 1978
Filed:
Dec. 29, 1977
Applicant:
Inventors:
Robert S Miller, Chappaqua, NY (US);
Francis J Doyle, Newark, DE (US);
Assignee:
Stauffer Chemical Company, Westport, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
260 / ; 260 / ; 528500 ;
Abstract
Residual unreacted monomer, such as vinyl chloride monomer, is removed from an aqueous latex of polymer, such as polyvinyl chloride, by allowing the latex to flow as a thin liquid film down the inner surface of a substantially vertical column at subatmospheric pressure countercurrent to an ascending flow of steam. If desired, packing may be inserted in the column to enhance the removal of residual monomer.