The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 19, 1978

Filed:

Jul. 01, 1977
Applicant:
Inventors:

Eugene D Feit, Berkeley Heights, NJ (US);

Larry F Thompson, Gillette, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
96 351 ; 156643 ; 156901 ; 96 362 ; 9611 / ; 96 8 / ; 20415913 ;
Abstract

Negative resist compositions are based on carbonaceous polymers with substituent branches containing epoxy groupings. Exemplary materials which include, for example, a copolymer of glycidyl methacrylate and ethyl acrylate in which epoxy groupings are unesterified show high sensitivity, for example, to electron radiation and to X-rays. Resolution is sufficient to permit expedient fabrication of detailed resist patterns for integrated circuits. High adherence permits use of acid or base reagents and thermal stability permits use of ion milling for circuit fabrication.


Find Patent Forward Citations

Feit, Eugene. (1978). Process using radiation curable epoxy containing resist and resultant (U.S. Patent No. 4130424). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4130424

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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