The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 1978
Filed:
Dec. 19, 1977
Basil P Leftheris, Huntington, NY (US);
Joseph H Mainhardt, Huntington, NY (US);
Walter Schwenk, Huntington, NY (US);
Grumman Aerospace Corporation, Bethpage, NY (US);
Abstract
A method and apparatus therefor using the stress wave phenomenon for sizing and working a hole in a workpiece. A mandrel of the desired size, shape, and finish is 'driven' into the hole by a stress wave to work the hole and impart thereto a desired shape, size, and finish. Electromagnetic means are used to generate the stress wave whose characteristics are such that it can be propagated through the mandrel and into the workpiece with a pulse energy level, rise rate, and duration sufficient to put the material in the walls of the hole into a condition of plastic flow so that a permanent deformation thereof conforming to the working area of the mandrel is achieved. A straight or a tapered hole can be worked or a straight hole can be converted into a tapered hole having the desired final shape, size, and finish. In a further embodiment, the mandrel used in the method can be the fastener for which the hole has been drilled. If required, more than one stress wave pulse can be used to achieve the desired working of the hole.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile