The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 1978
Filed:
Aug. 04, 1977
John A Thornton, Los Angeles, CA (US);
Telic Corporation, Santa Monica, CA (US);
Abstract
Cathode sputtering apparatus and a related method for its use in sputter cleaning and bias sputtering operations, in which work-pieces to be sputter-cleaned are secured to a cathode assembly in a configuration lending itself to the utilization of plasma traps which are highly conducive to efficient sputtering. Two basic embodiments are disclosed. In one embodiment, the cathode assembly takes the form of a hollow cylinder with inwardly projecting end flanges, the work-pieces being mounted with their surfaces to be cleaned facing inwardly, and in the other embodiment it takes the form of a cylindrical post with outwardly projecting end flanges, with the surfaces to be cleaned facing outwardly.Also disclosed are related techniques for sputter coating work-pieces immediately following a sputter cleaning step.