The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 1978
Filed:
Jan. 06, 1977
John R Vig, Colts Neck, NJ (US);
Erich Hafner, Tinton Falls, NJ (US);
Ronald P Andres, Princeton, NJ (US);
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Abstract
A novel, high-flux source for use in the vapor deposition of electrode maials, such as gold, during the fabrication of precision quartz-crystal resonators, or the like. The design is based on the theory and technology of nozzle beams. The nozzle beam type source disclosed herein is conceived: (1) to permit large deposition rates with minimum wastage of electrode material; (2) to operate in high vacuum; (3) to emit vapor in a horizontal direction, thereby permitting the use of a pair of sources to plate both sides of a substrate simultaneously; and (4) to operate for extended periods of time without requiring frequent breaking of the vacuum in order to replenish the source. It is estimated that this design can operate at a deposition rate equal or above that of a conventional evaporation-type source with less than one percent of the wastage of electrode material experienced with a conventional source.