The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 1978

Filed:

Mar. 22, 1977
Applicant:
Inventors:

Atsushi Kawamura, Tokyo, JP;

Yoshio Fukushima, Tokyo, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V / ;
U.S. Cl.
CPC ...
362300 ; 362346 ; 362347 ; 362350 ;
Abstract

A microfiche on which a large number of characters are formed in an alternating arrangement is movable behind a mask in such a manner that at each position of the microfiche relative to the mask a desired group of characters is displayed through respective apertures in the mask. Lenses are disposed behind the apertures to project images of the characters therethrough onto a viewing screen. A reflection support member is disposed behind the microfiche and is formed with a stepped surface on which are disposed a plurality of concave reflectors, one reflector behind each lens. A lamp radiates light onto the reflectors, from which the light is reflected and focussed into the respective lenses, thereby illuminating the characters on the microfiche from behind. The radii of curvature and light receiving frontal areas of the reflectors differ in accordance with the distances of the reflectors from the lamp and the respective lenses.


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