The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 1978
Filed:
Mar. 01, 1977
Richard W Dixon, Bernardsville, NJ (US);
Louis A Koszi, Scotch Plains, NJ (US);
Franklin R Nash, Griggstown, NJ (US);
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Abstract
Current confinement in semiconductor devices by means of buried high resistivity zones is described. For example, in a stripe geometry, semiconductor, junction laser the laterally separate, high resistivity zones, which confine current flow in a narrow channel between the upper and lower electrical contacts, are buried below the upper contact. This configuration permits current to flow from the upper contact into the body of the semiconductor over greatly increased area before it enters the channel. The current density at the interface between the upper contact and the semiconductor body is thereby reduced, making the quality of that interface less important. Several processes which employ proton bombardment for fabricating the laser are also described: (1) in one the normal sequence of Zn diffusion and proton bombardment is reversed, and (2) in the other the profiles of Zn doping and proton damage are suitably tailored.