The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 1978
Filed:
Feb. 23, 1976
Donald C Mead, Granada Hills, CA (US);
Harvey L Kasdan, Van Nuys, CA (US);
Jordan L Dorrity, Greenwood, SC (US);
Greenwood Mills, Inc., Greenwood, SC (US);
Abstract
Fabric such as textile material is automatically inspected at high speed by diffraction of light techniques. The fabric is moved through a plane and irradiated with monochromatic light of given cross sectional area sufficient to encompass a large number of warp and fillings making up the fabric. The diffraction pattern developed after the beam has passed through the fabric is detected and various regions of this diffraction pattern are processed to provide data indicative of the quality of the fabric. The major regions involved in the diffraction pattern include the developed central lobe and first order side lobes along orthogonal axes normal to the directions of the warps and filling threads of the fabric.