The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 1978

Filed:

Sep. 28, 1976
Applicant:
Inventors:

Kozo Yano, Tenri, JP;

Yasuhiko Inami, Nishinomiya, JP;

Hiroshi Hamada, Tenri, JP;

Hisashi Uede, Wakayama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
29570 ; 350357 ;
Abstract

Electrochromic display device manufacture method wherein electrochromic material is deposited in a single layer on a single film of conductive material over the whole area of glass substrate and then the electrochromic material and conductive material are successively etched through a single mask which defines a display segment pattern and remains in position throughout the whole etching process, whereby etched edge portions of the different materials are in excellent alignment and there is therefore small plate area for a reverse emf cell and good display device performance is achieved. The electrochromic material may be etched by the solution employed for developing the photoresist, whereby an etching process step is eliminated.


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