The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1978
Filed:
Jan. 18, 1977
Applicant:
Inventors:
Nobuyuki Kita, Odawara, JP;
Yasuhisa Narutomi, Odawara, JP;
Assignees:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
National Patent Development Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
96 9 / ; 9611 / ; 9611 / ; 96 8 / ; 96 351 ;
Abstract
A photosensitive composition is prepared comprising (a) a copolymer having an acid value of 10 to 100 and containing structural units represented by the following general formula I ##STR1## where R.sub.1 represents a hydrogen atom or methyl group, R.sub.2 represents a hydrogen atom, methyl group, ethyl group or chloromethyl group, and n is an integer of from 1 to 10, inclusive, and structural units represented by the following general formula II ##STR2## where, in the formula, R.sub.3 represents a hydrogen atom or methyl group, and